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junyan1608

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[交流] 向大家介绍几本化学气相沉积的书

1.Chemical Vapor Deposition: Principles and Applications (Hardcover)
by Michael L. Hitchman, Klavs F. Jensen

Details
Hardcover: 677 pages
Publisher: Academic Press (April 13 1993)
Language: English
ISBN-10: 0123496705
ISBN-13: 978-0123496706
Product Dimensions: 23.7 x 16 x 8.2 cm
Shipping Weight: 1.2 Kg

Book Description
This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.

2.Principles of Chemical Vapor Deposition (Hardcover)
by D.M. Dobkin, M.K. Zuraw

Details
Hardcover: 288 pages
Publisher: Springer; 1 edition (April 1, 2003)
Language: English
ISBN-10: 1402012489
ISBN-13: 978-1402012488
Product Dimensions: 9.2 x 7 x 0.7 inches
Shipping Weight: 1.4 pounds

Book Description

Do you work with chemical Vapor deposition processes or reactors? Have you ever wondered what goes on inside the chamber or how the deposition processes work? If the answer to this is yes, then Principles of Chemical Vapor Deposition is for you!

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.

This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

This book will be invaluable to process engineers, graduate students and researchers newly involved in the development of processes and hardware for chemical vapor deposition. In addition, the book is appropriate for senior level undergraduates or graduate courses on chemical vapor deposition as well as semiconductor manufacturing and coating technologies.

3.Thin films by chemical vapour deposition
by CE Morosanu

Details
Hardcover: 717 pages
Publisher: Elsevier Publishing Company (February 1990)
Language: English
ISBN-10: 0444988017
ISBN-13: 978-0444988010
Product Dimensions: 10 x 6.8 x 1.5 inches
Shipping Weight: 3 pounds

Book Description
The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films. Present status and future trends in CVD films. References. Index of Acronyms and Abbreviations. Author Index. CVD Film Index. Subject Index. Supplier Index.

4.CVD of nonmetals by WS Rees

Author(s): Rees, William S., Jr
Edition: 1st
ISBN: 3527292950
ISBN13: 9783527292950
Cover: Hardcover
Copyright: 07/01/1996

Synopsis: Written by leading experts in the field, this practical reference handbook offers an up-to-date, critical survey of the chemical vapor deposition (CVD) of nonmetals, a key technology in semiconductor electronics, finishing, and corrosion protection.

The basics necessary for any CVD process are discussed in the introduction. In the following chapters, precursor requirements, with an emphasis on materials chemistry, common structures of reactants and substrates, as well as reaction control are discussed for a broad range of compositions including superconducting, conducting, semiconducting, insulating and structural materials. Technological issues, such as reactor geometries and operation parameters, are assessed and the viability of the method, both technically and economically, is compared with other techniques for the preparation of thin films.

Relevant materials and technical data are collected in tables throughout. An extensive glossary, list of abbreviations and acronyms, and over 1400 references round off this impressive work.

The 'CVD of Nonmetals' offers a stimulating combination of basic concepts and practical applications. Materials scientists, solid-state and organometallic chemists, physicists, engineer, as well as graduate students will find this book of enomous value.

5.The chemistry of metal CVD
by Toivo T. Kodas, Mark J. Hampden-Smith, Mark J. Hampden- Smith

Gebundene Ausgabe: 530 Seiten
Verlag: Wiley-VCH (1994)
Sprache: Englisch
ISBN-10: 3527290710
ISBN-13: 978-3527290710
Größe und/oder Gewicht: 24,8 x 17,8 x 1,9 cm

The major problems associated with CVD of metals have been the lack of suitable precursors that deposit high-purity metals at low temperatures and the poor understanding of the chemistry of CVD using existing precursors. To alleviate these problems, information about precursors, their behavior in CVD reactors, the use of the metals in integrated circuits, and film properties is provided. Addressed are CVD of aluminum, tungsten, copper, gold, silver, platinum, lead, nickel, and other metals. Emphasis is on fabrication of microelectronic devices.

[ Last edited by junyan1608 on 2007-12-14 at 21:35 ]

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