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[资源] 【ebook】Materials Science of Thin Films

The Materials Science of Thin Films (Hardcover)
by Milton Ohring (Author)

Hardcover: 800 pages
Publisher: Academic Press; 2 edition (October 15, 2001)
Language: English
ISBN-10: 0125249756

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Second Edition

By
Milton Ohring, Stevens Institute of Technology, New Jersey, U.S.A.

Description
This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

Audience
Advanced undergraduate and first-year graduate students in materials science and electrical engineering; researchers in industrial in-house courses, or short courses offered by professional societies.

Contents
Foreword to First Edition Preface Acknowledgments A Historical Perspective Chapter 1 A Review of Materials Science 1.1. Introduction 1.2. Structure 1.3. Defects in Solids 1.4. Bonds and Bands in Materials 1.5. Thermodynamics of Materials 1.6. Kinetics 1.7. Nucleation 1.8. An Introduction to Mechanical Behavior 1.9. Conclusion Exercises References Chapter 2 Vacuum Science and Technology 2.1. Introduction 2.2. Kinetic Theory of Gases 2.3. Gas Transport and Pumping 2.4. Vacuum Pumps 2.5. Vacuum Systems 2.6. Conclusion Exercises References Chapter 3 Thin-Film Evaporation Processes 3.1. Introduction 3.2. The Physics and Chemistry of Evaporation 3.3. Film Thickness Uniformity and Purity 3.4. Evaporation Hardware 3.5. Evaporation Processes and Applications 3.6. Conclusion Exercises References Chapter 4 Discharges, Plasmas, and Ion-Surface Interactions 4.1. Introduction 4.2. Plasmas, Discharges, and Arcs 4.3. Fundamentals of Plasma Physics 4.4. Reactions in Plasmas 4.5. Physics of Sputtering 4.6. Ion Bombardment Modification of Growing Films 4.7. Conclusion Exercises References Chapter 5 Plasma and Ion Beam Processing of Thin Films 5.1. Introduction 5.2. DC, AC, and Reactive Sputtering Processes 5.3. Magnetron Sputtering 5.4. Plasma Etching 5.5. Hybrid and Modified PVD Processes 5.6. Conclusion Exercises References Chapter 6 Chemical Vapor Deposition 6.1. Introduction 6.2. Reaction Types 6.3. Thermodynamics of CVD 6.4. Gas Transport 6.5. Film Growth Kinetics 6.6. Thermal CVD Processes 6.7. Plasma-Enhanced CVD Processes 6.8. Some CVD Materials Issues 6.9. Safety 6.10. Conclusion Exercises References Chapter 7 Substrate Surfaces and Thin-Film Nucleation 7.1. Introduction 7.2. An Atomic View of Substrate Surfaces 7.3. Thermodynamic Aspects of Nucleation 7.4. Kinetic Processes in Nucleation and Growth 7.5. Experimental Studies of Nucleation and Growth 7.6. Conclusion Exercises References Chapter 8 Epitaxy 8.1. Introduction 8.2. Manifestations of Epitaxy 8.3. Lattice Misfit and Defects in Epitaxial Films 8.4. Epitaxy of Compound Semiconductors 8.5. High-Temperature Methods for Depositing Epitaxial Semiconductor Films 8.6. Low-Temperature Methods for Depositing Epitaxial Semiconductor Films 8.7. Mechanisms and Characterization of Epitaxial Film Growth 8.8. Conclusion Exercises References Chapter 9 Film Structure 9.1. Introduction 9.2. Structural Morphology of Deposited Films and Coatings 9.3. Computational Simulations of Film Structure 9.4. Grain Growth, Texture, and Microstructure Control in Thin Films 9.5. Constrained Film Structures 9.6. Amorphous Thin Films 9.7. Conclusion Exercises References Chapter 10 Characterization of Thin Films and Surfaces 10.1. Introduction 10.2. Film Thickness 10.3. Structural Characterization of Films and Surfaces 10.4. Chemical Characterization of Surfaces and Films 10.5. Conclusion Exercises References Chapter 11 Interdiffusion, Reactions, and Transformations in Thin Films 11.1. Introduction 11.2. Fundamentals of Diffusion 11.3. Interdiffusion in Thin Metal Films 11.4. Compound Formation and Phase Transformations in Thin Films 11.5. Metal-Semiconductor Reactions 11.6. Mass Transport in Thin Films under Large Driving Forces 11.7. Conclusion Exercises References Chapter 12 Mechanical Properties of Thin Films 12.1. Introduction 12.2. Mechanical Testing and Strength of Thin Films 12.3. Analysis of Internal Stress 12.4. Techniques for Measuring Internal Stress in Films 12.5. Internal Stresses in Thin Films and Their Causes 12.6. Mechanical Relaxation Effects in Stressed Films 12.7. Adhesion 12.8. Conclusion Exercises References Index

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