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2013年新著——先进平版印刷术的补充资料（英文版）
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"Updates in Advanced Lithography" ed. by Sumio Hosaka InTeOpP | 2013 | ISBN: 9535111757 9789535111757 | 259 pages | PDF | 24 MB This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications. Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. Contents Preface Section 1 Lithography for 3D Structure and Nano Scale 1 Colloidal Lithography 2 Recent Advances in Two-Photon Stereolithography 3 Femtosecond Laser Lithography in Organic and Non-Organic Materials 4 Three-Dimensional Lithography Using Combination of Nanoscale Processing and Wet Chemical Etching 5 Combination of Lithography and Coating Methods for Surface Wetting Control Section 2 Resist 6 Resist Homogeneity Section 3 Nanoimprint 7 Soft UV Nanoimprint Lithography and Its Applications 8 Sub-30 nm Plasmonic Nanostructures by Soft UV Nanoimprint Lithography Section 4 Fabrication of 3D Nano-Structure 9 The Fabrication of High Aspect Ratio Nanostructures on Quartz Substrate 10 Fabrication of 3D Micro- and Nano-Structures by Prism-Assisted UV and Holographic Lithography  InTeOpP | 2013 | ISBN: 9535111757 9789535111757 | 259 pages | PDF | 24 MB |
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