|
|
【答案】应助回帖
★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ...
十廾卅卌: 金币+90, 翻译EPI+1, ★有帮助, 不好意思，你们发的有点晚了，我没有用，但还是感谢。 2013-06-08 19:59:07
|
To survey the deposition thickness of the composite film, in this article, a composite film composed of metallic copper and graphite was prepared on the substrate of the common glass by a direct current sputtering method. The effect of sputtering technological conditions on the thickness of the composite film was investigated through adjusting a series of technological parameters including the height of the substrate platform, the pressure, current and voltage of sputtering. The thickness of the film prepared by sputtering method was determined with a film thickness tester. The optimal technological conditions of preparing the composite film composed of metallic copper and graphite was systematically discussed as well. |
|
回复此楼