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氢终端掺硼金刚石(H-BDD)薄膜具有优异的物理化学性质,从而使其具有广泛的用途。但其化学惰性使其表面可再造性差,无法满足各种功能材料的需求,因此,要扩展H-BDD薄膜的应用,必须对其表面进行功能化修饰,导入各种官能团,使其在功能材料领域的应用更加广泛。本文通过光化学方法将氨基导入H-BDD表面,并通过接触角、X射线光电子能谱仪、电化学工作站对修饰过程的H-BDD薄膜表面进行表征分析,确定氨基导入情况。 求英文翻译 谢谢 不要谷歌或其他软件的翻译 专业点 |
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爱与雨下: 金币+1 2013-05-16 22:07:18
Z_erO(phu_grassman代发): 金币+20, 翻译EPI+1, good job. Thanks 2013-09-23 08:33:59
爱与雨下: 金币+1 2013-05-16 22:07:18
Z_erO(phu_grassman代发): 金币+20, 翻译EPI+1, good job. Thanks 2013-09-23 08:33:59
| The H-BDD film has extensive industrial uses for its brilliant physical and chemical properties.Its chemical inertness causes the surface to have poor reproductivity, thereby H-BDD film can not satisfy the needs of various functional materials. Thus the application of H-BDD film must be expanded with surface functionalization and the import of functional groups, in order to make H-BDD film be widely applied in the field of functional materials. The paper plans to import amidogen into the surface of H-BDD by chemical methods, and characterize the surface in the modifying process by means of contact angle, X-ray Photoelectron Spectrometer and electrochemical workstation to ensure the import of amidogen. |
2楼2013-05-12 21:52:51
