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1。Mao et al.[33] deposited thin Ta/NiFe films using three different deposition techniques: ion beam deposition (IBD), pulsed, and static magnetron sputtering. Among them, IBD films show a relatively high MR ratio and, in particular, a higher MR change at low NiFe thickness. They found IBD films exhibit higher MR ratios, while little difference is noted between different deposition techniques in the sheet resistance of NiFe films. 2。Later, Lee et al.[27] held that the thin film with better texture structure generally corresponds to larger values of MR, while the low value of MR can be attributed to the random orientation. 注意读起来连贯，逻辑什么的 [ Last edited by 柠檬树 on 2013-4-29 at 11:57 ] |
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3楼2013-04-30 10:16:08
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phu_grassman: 金币+1, funny enough, haha. 2013-06-29 11:53:38
phu_grassman: 金币+1, funny enough, haha. 2013-06-29 11:53:38
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