| 查看: 733 | 回复: 1 | ||
| 本帖产生 1 个 翻译EPI ，点击这里进行查看 | ||
[求助]
编辑说英语比较差，英文求润色啊！！谢谢阿
|
||
|
H. Funaki et al. prepared Ni80Fe20 films with the thickness of 20 nm, which exhibited a high MR of 3.5% after an appropriate post-annealing treatment. The improvement is due to the decrease of zero-field resistivity resulting from remarkable grain growth in the films. Taking into account diffusive electron scattering at the film surface, the MR value is thought to be very close to that of the bulk. In 2003, the Ni83Fe17 films prepared by Wu et al. at the substrate temperature above 350℃ and then annealed at 650℃ for 1 h exhibit good MR properties. The decrease in resistivity and the increase in AMR ratio are caused by the decrease in point defects, the increase in grain size, and the improvement in grain lattice integrity of the films. Most recently, Wang et al. prepared a series of Ni81Fe19 films by magnetron sputtering method in a lower test condition and won an excellent test result. The Ni81Fe19 films prepared at the substrate temperatures of 400 ℃ showed a higher AMR value and a lower saturation magnetic field. |
回复此楼» 猜你喜欢
十年后又回来了，论文投稿求助
已经有3人回复
-
纯娱乐，不喜欢勿喷
已经有10人回复
-
面上再次挂了，太难了，躺也躺不了，倦也卷不过，小学校之殇！
已经有26人回复
-
面上提前没消息，有中的吗
已经有18人回复
-
娱乐
已经有4人回复
-
系统今天又提示维护了，估计离放榜不远了
已经有16人回复
-
一个有机合成实验室都需要哪些设备？
已经有10人回复
-
什么时候能放榜呀？
已经有3人回复
-
UV压敏胶开发
已经有5人回复
-
2026年国自然面上资助率
已经有22人回复
hookhans
铁杆木虫 (著名写手)
Farmer
- 翻译EPI: 263
- 应助: 186 (高中生)
- 贵宾: 0.142
- 金币: 7889
- 散金: 576
- 红花: 51
- 帖子: 2095
- 在线: 402.1小时
- 虫号: 2260260
- 注册: 2013-01-25
- 专业: 催化化学
【答案】应助回帖
★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★ ★
Carena: 金币+2, 感谢应助，辛苦 2013-04-28 17:05:02
柠檬树: 金币+15, 翻译EPI+1, ★★★★★最佳答案, 果酱啦 哈 2013-04-28 22:29:05
Carena: 金币+2, 感谢应助，辛苦 2013-04-28 17:05:02
柠檬树: 金币+15, 翻译EPI+1, ★★★★★最佳答案, 果酱啦 哈 2013-04-28 22:29:05
|
谨供参考,注意严谨------你写的已经够可以的了. H. Funaki et al. prepared Ni80Fe20 films with the thickness of 20 nm, which exhibited an improved MR of 3.5% after appropriate post-annealing treatment. The improvement is due to the decrease of the zero-field resistivity resulting from remarkable grain growth in the films. Taking into account the diffusive electron scattering at the film surface, the MR value of the film(那个和那个的MRvalue 比较要说清) is thought to be very close to that of the bulk. In 2003, the Ni83Fe17 films prepared by Wu et al. at the substrate temperature above 350℃ and post-annealing temperature of 650℃exhibited good MR properties. It was demonstrated that the decrease in resistivity and the increase in AMR ratio were due to the decrease in point defects, the increase in grain size, and the improvement of the grain lattice integrity in the films. Most recently, Wang et al. prepared a series of Ni81Fe19 films by magnetron sputtering method in a lower test condition and obtained an excellent test result. They showed that the Ni81Fe19 films prepared at the substrate temperatures of 400 ℃ exhibited a higher AMR value and a lower saturation magnetic field. |
2楼2013-04-28 16:25:13