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Lead Contributor: Molecular Imprints, Inc. Lithography Beyond 32 nm: A Role for Imprint? (paper) Mark Melliar-Smith. SPIE Advanced Lithography Plenary Paper, February 2007. Lithography Beyond 32 nm: A Role for Imprint? (presentation) Mark Melliar-Smith. SPIE Advanced Lithography Plenary Presentation, February 2007. Toward 22 nm for Unit Process Development Using Step and Flash Imprint Lithography (paper) Gerard Schmid, Ecron Thompson, Nick Stacey, Doug Resnick, Deirdre Olynick, Erik Anderson. SPIE Advanced Lithography Paper, February 2007. Toward 22 nm for Unit Process Development Using Step and Flash Imprint Lithography (presentation) Gerard Schmid, Ecron Thompson, Nick Stacey, Doug Resnick, Deirdre Olynick, Erik Anderson. SPIE Advanced Lithography Presentation, February 2007. Whole Wafer Imprint Patterning Using Step and Flash Imprint Lithography: A Manufacturing Solution for Sub 100 nm Patterning (paper) David Lentz, Gary Doyle, Mike Miller, Gerard Schmid, Maha Ganapathisubramanian, Xiaoming Lu, Doug Resnick, Dwayne LaBrake. SPIE Advanced Lithography Paper, February 2007. Whole Wafer Imprint Patterning Using Step and Flash Imprint Lithography: A Manufacturing Solution for Sub 100 nm Patterning (poster) David Lentz, Gary Doyle, Mike Miller, Gerard Schmid, Maha Ganapathisubramanian, Xiaoming Lu, Doug Resnick, Dwayne LaBrake. SPIE Advanced Lithography Poster, February 2007. A Study of Imprint-Specific Defects in the Step and Repeat Imprint Lithography Process Joseph Perez, Kosta Selindis, Steven Johnson, Brian Fletcher, Frank Xu, Ian McMackin, Doug Resnick, S.V.Sreenivasan. SPIE Advanced Lithography Presentation, February 2007. High Volume Full-Wafer Step and Flash Imprint Lithography Doug Resnick, Gerard Schmid, Mike Miller, Gary Doyle, Chris Jones, Dwayne LaBrake. Solid State Technology, February 2007. Direct Die-to-Database Electron Beam Inspection of Fused Silica Imprint Templates Doug Resnick, L. Jeff Myron, Ecron Thompson, Toshiaki Hasebe, Toshifumi Tokumoto, C. Yan, M. Yamamoto, H. Wakamori, M. Inoue, Eric Ainley, Keven Nordquist, William Dauksher. Journal of Vacuum Sciene and Technology B, November 2006. Implementation of an Imprint Damascene Process for Interconnect Fabrication Gerard Schmid, Michael Stewart, Jeffrey Wetzel, Frank Palmieri, Jian Hao, Yukio Nishmura, Kane Jen, Eui Kyoon Kim, Doug Resnick, Alex Liddle, C. Grant Willson. Journal of Vacuum Sciene and Technology B, November 2006. Imprinting Technique Offers Low-Cost Photonic Crystal LEDs Robert Hershey. Compund Semiconductor, October 2006. Step and Flash Imprint Lithography Templates for the 32nm Node and Beyond Gerard Schmid, Ecron Thompson, Douglas Resnick, Deidre Olynick, Alexander Liddle, MNE, September 2006. 2D Photonic Crystal Patterning for High Volume LED Manufacturing Robert Hershey, Mike Miller, Chris Jones, M. GanapathiSubramanian, Xiaoming Lu, Gary Doyle, David Lentz, Dwayne LaBrake. SPIE Optics and Photonics manuscript, August 2006. Defect Inspection for Imprint Lithography Using a Die to Database Electron Beam Verification System L. Jeff Myron, Ecron Thompson, Ian McMackin, Doug Resnick, Tadashi Kitamura, Toshiaki Hasebe, Shinichi Nakazawa, Toshifumi Tokumoto, Eric Ainley, Keven Nordquist, William Dauksher. SPIE Proceedings Vol 6151, 2006. Imprint Lithography Advanced in LED Manufacturing Robert Hershey, Gary Doyle, Chris Jones, Dwayne LaBrake, Mike Miller. ISBLLED 2006. Advanced Prototyping Using Step and Flash Imprint David Wang, Tom Rafferty, Phil Schumaker, Ian McMackin, David Vidusek, S.V. Sreenivasan. Solid State Technology, December 2005. An Enabling Technology for Nanoscale Manufacturing:S-FIL™ NSTI Nano Impact Summit, October 2005. Fabrication of Nanometer Sized Features on Non-Flat Substrates Using a Nano-Imprint Lithography Process Mike Miller, Gary Doyle, Nick Stacey, Frank Xu, S.V. Sreenivasan, Mike Watts, Dwayne LaBrake. SPIE Microlithography Conference, February 2005. S-FIL Technology: Cost of Ownership Case Study Sunil Murty, Michael Falcon, S.V. Sreenivasan, Daren Dance SPIE Microlithography Conference, February 2005. Advanced Mask Metrology Enabling Characterization of Imprint Lithography Templates L. Jeff Myron, Liraz Gershtein, Gidi Gottlieb, Bob Burkhardt, Andrew Griffiths, David Mellenthin, Kevin Rentzsch, Susan MacDonald, Greg Hughes SPIE Microlithography Conference, February 2005. Step and Flash Imprint Lithography Doug Resnick, S.V. Sreenivasan, C. Grant Willson Materials Today, February 2005. Molecular Imprint: A Case Study on Success Through Strategic Industry and Academic Partnerships Michael Falcon and Angela Ausman Nanotechnology Law & Buisiness, vol 1.4. Distortion and Overlay Performance of UV Step and Repeat Imprint Lithography Jin Choi, K. J. Nordquist, Ashuman Cherala, Lester Casoose, Kathleen Gehoski, William Dauksher, S.V. Sreenivasan, Doug Resnick MNE Micro- and Nano- Engineering Conference, September 2004. Development of Imprint Materials for the Step and Flash Imprint Lithography Process Frank Xu, Nick Stacey, Mike Watts, Van Truskett, Ian McMackin, Jin Choi, Philip Schumaker, Ecron Thompson, Daniel Babbs, S.V. Sreenivasan, Grant Willson, Norm Schumaker. SPIE Microlithography Conference, February 2004. Nanotechnology Small Print S.V. Sreenivasan, Grant Willson, Doug Resnick. Small Print 2004. Design and Performance of a Step and Repeat Imprinting Machine Ian McMackin, Philip Schumaker, Daniel Babbs, Jin Choi, Wenli Collison, S.V. Sreenivasan, Norman Schumaker, Michael Watts, Ronald Voisin. SPIE Microlithography Conference, February 2003. Fabrication of Step and Flash Imprint Lithography Templates Using Commercial Mask Processes Ecron Thompson, Peter Rhyins, Ron Voisin, S.V. Sreenivasan, Patrick Martin. SPIE Microlithography Conference, February 2003. Cost of Ownership Analysis for Patterning Using Step and Flash Imprint Lithography S.V. Sreenivasan, C.G. Willson, N.E. Schumaker, D.J. Resnick. NIST-SPIE Conference on Nanotechnology, September 2002. Lead Contributor: University of Texas at Austin 下载的同时勿忘评分！！！ |
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Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics (paper) Wei-lun Jen, Frank Palmieri, Brook Chao, Michael Lin, Jianjun Hao, Jordan Owens, Ken Sotoodeh, Robin Cheung, C.Grant Willson. SPIE Advanced Lithography Paper, February 2007. Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics (presentation) Wei-lun Jen, Frank Palmieri, Brook Chao, Michael Lin, Jianjun Hao, Jordan Owens, Ken Sotoodeh, Robin Cheung, C.Grant Willson. SPIE Advanced Lithography Presentation, February 2007. Effects of Etch Barrier Densification on Step and Flash Lithography Steve Johnson, R. Burns, E.K. Kim, M.D. Dickey, Gerard Schmid, J. Meiring, S. Burns, C. Grant Willson, D. Convey, Y. Wei, P. Fejes, K. Gehoski, D. Mancini, K. Nordquist, W. Dauksher, Doug Resnick. Journal of Vacuum Science and Technology, November 2005. Direct Imprinting of Dielectric Materials for Dual Damascene Processsing Michael D. Stewart, Jeffrey Wetzel, Gerard Schmid, Frank Palmieri, Ecron Thompson, E.K. Kim, D. Wang, K. Sotoodeh, K. Jen, S.C. Johnson, J. Hao, M.D. Dickey, Y. Nishimura, R. Laine, D.J. Resnick, C.G. Willson. SPIE Microlithography Conference, February 2003. Advances in Step and Flash Imprint Lithography S.C. Johnson, T.C. Bailey, M.D. Dickey, B.J. Smith, E.K. Kim, A.T. Jamieson, N.A. Stacey, J.G. Ekerdt, and C.G. Willson. SPIE Microlithography Conference, February 2003. Employing Step and Flash Imprint Lithography for Gate Level Patterning of a MOSFET Device B.J. Smith, N.A. Stacey, J.P. Donnelly, D.M. Onsongo, T.C. Bailey, C.J. Mackay, D.J. Resnick, W.J. Dauksher, D. Mancini, K.J. Nordquist, S.V. Sreenivasan, S.K. Banerjee, J.G. Ekerdt, C.G. Willson. SPIE Microlithography Conference, February 2003. Step and Flash Imprint Lithography: Defect Analysis T. Bailey, B. Smith, B.J. Choi, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt, C.G. Willson. J. Vac. Sci. Technology B, Nov/Dec 2001, pp. 2806-2810. Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers M. Colburn, I. Suez, B.J. Choi, M. Meissl, T. Bailey, S.V. Sreenivasan, J. G. Ekerdt, C. G. Willson. J. Vac. Sci. Technology B, Nov/Dec 2001, pp. 2685-2689. Design of Orientation Stages for Step and Flash Imprint Lithography B. J. Choi, S. Johnson, M. Colburn, S.V. Sreenivasan, C.G. Willson. Journal of Int. Societies for Precision Engineering and Nanotechnology, Volume 25, No. 3, pp. 192-199, July, 2001. Development and Advantages of Step-and-Flash Lithography M. Colburn, T. Bailey, B. J. Choi, J.E. Ekerdt, S.V. Sreenivasan, C.G. Willson. Solid State Technology, July 2001. Layer to Layer Alignment for Step and Flash Imprint Lithography B.J. Choi, M. Meissl, Y.J. Choi, M. Kerwick, M. Colburn, T. Bailey, S.V. Sreenivasan, J.G. Ekerdt, C.G. Willson. SPIE's 26th Intl. Symp. Microlithography: Emerging Lithographic Technologies, Feb. 27 - Mar. 1, 2001 Santa Clara, CA. Step and Flash Imprint Lithography: Template Surface Treatment and Defect Analysis T. Bailey, B. J. Choi, M. Colburn, A. Grot, M. Meissl, S. Shaya, J.G. Ekerdt, S.V. Sreenivasan, C.G. Willson. American Vacuum Society J. of Vac. Sci. & Technol. B, Vol. 18, No. 6, Nov/Dec 2000, pp. 3572-3577. Partially Constrained Compliant Stages for High Resolution Imprint Lithography B. J. Choi, S. Johnson, S.V. Sreenivasan, M. Colburn, T. Bailey, C.G. Willson. 2000 Proceedings of the ASME 2000 Design Engineering Technical Conference, DETC2000/MECH-4145, Sept. 10 - 13, 2000, Baltimore, Maryland. Step and Flash Imprint Lithography for sub-100nm Patterning M. Colburn, A. Grot, M. Amistoso, B. J. Choi, T. Bailey, J. Ekerdt, S.V. Sreenivasan, J. Hollenhorst, C. G. Willson. 2000 SPIE's 25th Intl. Symp. Microlithography: Emerging Lithographic Technologies III. Feb. 28 - Mar. 3, 2000 Santa Clara, CA. Patterning Curved Surfaces: Template Generation by Ion Beam Proximity Lithography and Relief Transfer by Step and Flash Imprint Lithography P. Ruchhoeft, M. Colburn, B. Choi, H. Nounu, S. Johnson, T. Bailey, M. Stewart, J. Ekerdt, S.V. Sreenivasan, J.C. Wolfe, C.G. Willson. American Vacuum Society J. of Vac. Sci. Technol. B 17(6), pp. 2965-2969, Nov./Dec. 1999. Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B.J. Choi, M. Wedlake, T. Michaelson, S.V. Sreenivasan, J. Ekerdt, C.G. Willson. Proceedings of the SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, Vol. 3676, Part One, pp. 379-389, March 1999. Lead Contributor: Motorola Physical Sciences Lab Indium Tin Oxide Template Development for Step and Flash Imprint Lithography Kathleen Gehoski, D.J. Resnick, William Dauksher, Kevin Nordquist, Eric Ainley, Mark McCord, Mark Raphaelian, Harald Hess. SPIE Microlithography Conference, February 2005. Development of an Etch-definable Lift-Off Process for use with Step and Flash Imprint Lithography Ngoc V. Le, Kathleen Gehoski, William Dauksher, J. Baker, D.J. Resnick, Laura Dues. SPIE Microlithography Conference, February 2005 Repair of Step and Flash Imprint Lithography Templates William Dauksher, Kevin Nordquist, N.V. Le, Kathleen Gehoski, David Mancini, D.J. Resnick, R. Bozak, R. White, J. Csuy, D. Lee. J. Vac. Sci. Technol. B, Nov/Dec 2004, pp. 3306-3311. Image Placement Issues for ITO-based Step and Flash Imprint Lithography Templates Kevin Nordquist, Eric Ainley, David Mancini, William Dauksher, Kathleen Gehoski, J. Baker, D.J. Resnick, Z. Masnyj, P. Mangat. J. Vac. Sci. Technol. B, Mar/Apr 2004, pp. 695-701. Evaluation of the Imprio 100 Step and Flash Imprint Lithography Tool Doug Resnick, et al., February 2004. Initial Study of the Fabrication of Step and Flash Imprint Lithography Templates for the Printing of Contact Holes Doug Resnick, et al. SPIE Microlithography Conference, February 2004. Evaluation of the Imprio 100 Step and Flash Imprint Lithography Tool Doug Resnick, et al., February 2004. Step and Flash Imprint Lithography for sub-80nm Contact Holes D. Mancini, D. Resnick, S.V. Sreenivasan, M. Watts, Solid State Technology, February 2004. Initial Study of the Fabrication of Step and Flash Imprint Lithography Templates for the Printing of Contact Holes Doug Resnick, et al. SPIE Microlithography Conference, February 2004. Imprint Lithography for Integrated Circuit Fabrication Doug Resnick, et al. EIPBN Conference, June 2003. . J. Vac. Sci. Technol. B, Nov/Dec 2004. pp. 3265-3270 |
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Step and Flash Imprint Lithography Template Characterization, from an Etch Perspective Doug Resnick, et al. EIPBN Conference, June 2003. Making an Imprint Doug Resnick, Grant Willson, S.V. Sreenivasan OE Magazine, August 2003, pp. 18-20,37 Imprint Lithography: Lab Curiosity or the Real NGL? D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist, T. C. Bailey, S. Johnson, N. Stacey, J. G. Ekerdt, C. G. Willson, S V Sreenivasan, and N. Schumaker. SPIE Microlithography Conference, February 2003. Analysis of Critical Dimension Uniformity for step and flash imprint lithography David P. Mancini, Kathleen A. Gehoski, William J. Dauksher, Kevin J. Nordquist, Douglas J. Resnick, Philip Schumaker, and Ian McMackin. SPIE Microlithography Conference, February 2003. Hydrogen Silsesquioxane for Direct Electron-Beam Patterning of Step and Flash Imprint Lithography Templates D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D. J. Resnick,T. C. Bailey, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson. J. Vac. Sci. Technol. B, Nov/Dec 2002. Characterization of and Imprint Results Using Indium Tin Oxide-Based Step and Flash Imprint Lithography Templates W. J. Dauksher, K. J. Nordquist, D. P. Mancini, D. J. Resnick, J. H. Baker, A. E. Hooper, A. A. Talin, T. C. Bailey, A. M. Lemonds, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson. J. Vac. Sci. Technol. B, Nov/Dec 2002. High Resolution Templates for Step and Flash Imprint Lithography D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist, E. Ainley, K. Gehoski, J. H. Baker, T. C. Bailey, B. J. Choi, S. Johnson, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson. J. Microlith., Microfab., Microsyst., Vol. 1 No. 3, October 2002. Critical Dimension and Image Placement Issues for Step and Flash Imprint Lithography Templates Kevin J. Nordquist, David P. Mancini, William J. Dauksher, Eric S. Ainley, Kathy A. Gehoski, Douglas J. Resnick, Zorian S. Masnyj and Pawitter J. Mangat. 22nd Annual BACUS Symposium on Photomask Technology, Sept. 2002, Monterey CA. Release Layers for Contact and Imprint Lithography Douglas Resnick, David P. Mancini, S.V. Sreenivasan, C. Grant Willson. Semiconductor International, June 2002. Template Fabrication Schemes for Step and Flash Imprint Lithography T.C. Bailey, D.J. Resnick, D. Mancini, K.J. Nordquist, W. Dauksher, E. Ainley, A. Talin, K. Gehoski, J.H. Baker, B.J. Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt, C.G. Willson. Microelectronic Engineering, 61– 62 (2002), pp. 461– 467. High Resolution Templates for Step and Flash Imprint Lithography D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist, E. Ainley, K. Gehoski, J. H. Baker, T. C. Bailey, B. J. Choi, S. Johnson, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson. SPIE Microlithography Conference, February 2002. New Methods for Fabricating Step and Flash Imprint Lithography Templates D. J. Resnick, T. C. Bailey, D. Mancini, K. J. Nordquist, W. J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J. H. Baker, B. J. Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson. NIST-SPIE Conference on Nanotechnology, September 2001. Lead Contributor: University of Wisconsin Prediction of fabrication distortions in step and flash imprint lithography templates C. J. Martin, R. L. Engelstad, E. G. Lovell, D. J. Resnick, E. J. Weisbrod. J. Vac. Sci. Technol. B, Nov/Dec 2002. Lead Contributor: KLA-Tencor Inspection of templates for imprint lithography H. Hess, D. Pettibone, D. Adler, K. Bertsche, K. Nordquist, D. Mancini, W. Daukshur, D. Resnick. J. Vac. Sci. Technol. B, Nov/Dec 2004. Lead Contributor: Sandia National Laboratories, Livermore CA Fabrication of a surface acoustic wave-based correlator using step and flash imprint lithography G.F. Cardinale, J.L. Skinner, A.A. Talin, R.W. Brocato, D.W. Palmer, D. Mancini, W. Daukshur, K. Gehoski, N. Le, K. Nordquist, D. Resnick |
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