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[资源] 【EBook】Handbook of Physical Vapor Deposition (PVD) Processing

Book Properties
ISBN: 0815514220
Title: Handbook of Physical Vapor Deposition (PVD) Processing (Materials Science and Process Technology Series)
Author: Donald M. Mattox
Publisher: Noyes Publications
Publication Date: 1998-03-01
Number Of Pages: 949

http://mihd.net/yz3xwn

Book Description
  This book covers all aspects of Physical Vapor Deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post depostion processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications.
  The book covers subjects seldom treated in the literature: Substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories:, to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired.
  The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Key Features:
- Covers widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes, showing their relation to the practical issues that arise every day in PVD processing.
- Special format of the text allows a reader who is already knowledgeable in a particular subject to skim through a section and find essential points of particular interest.
- Especially detailed index helps readers find what they are looking for, plus a huge glossary of terms and acronyms in the industry.

Book content
Front Matter
Preface
Table of Contents

1. Introduction
1.1 Surface Engineering
1.2 Thin Film Processing
1.3 Process Documentation
1.4 Safety and Environmental Concerns
1.5 Units
1.6 Summary
Further Reading
References

2. Substrate ("Real"

Surfaces and Surface Modification
2.1 Introduction
2.2 Materials and Fabrication
2.3 Atomic Structure and Atom-Particle Interactions
2.4 Characterization of Surfaces and Near-Surface Regions
2.5 Bulk Properties
2.6 Modification of Substrate Surfaces
2.7 Summary
Further Reading
References

3. The Low-Pressure Gas and Vacuum Processing Environment
3.1 Introduction
3.2 Gases and Vapors
3.3 Gas-Surface Interactions
3.4 Vacuum Environment
3.5 Vacuum Processing Systems
3.6 Vacuum Pumping
3.7 Vacuum and Plasma Compatible Materials
3.8 Assembly
3.9 Evaluating Vacuum System Performance
3.10 Purchasing a Vacuum System for PVD Processing
3.11 Cleaning of Vacuum Surfaces
3.12 System-Related Contamination
3.13 Process-Related Contamination
3.14 Treatment of Specific Materials
3.15 Safety Aspects of Vacuum Technology
3.16 Summary
Further Reading
References

4. The Low-Pressure Plasma Processing Environment
4.1 Introduction
4.2 The Plasma
4.3 Plasma-Surface Interactions
4.4 Configurations for Generating Plasmas
4.5 Ion and Plasma Sources
4.6 Plasma Processing Systems
4.7 Plasma-Related Contamination
4.8 Some Safety Aspects of Plasma Processing
4.9 Summary
Further Reading
References

5. Vacuum Evaporation and Vacuum Deposition
5.1 Introduction
5.2 Thermal Vaporization
5.3 Thermal Vaporization Sources
5.4 Transport of Vaporized Material
5.5 Condensation of Vaporized Material
5.6 Materials for Evaporation
5.7 Vacuum Deposition Configurations
5.8 Process Monitoring and Control
5.9 Contamination from the Vaporization Source
5.10 Advantages and Disadvantages of Vacuum Deposition
5.11 Some Applications of Vacuum Deposition
5.12 Gas Evaporation and Ultrafine Particles
5.13 Other Processes
5.14 Summary
Further Reading
References

6. Physical Sputtering and Sputter Deposition (Sputtering)
6.1 Introduction
6.2 Physical Sputtering
6.3 Sputtering Configurations
6.4 Transport of the Sputter-Vaporized Species
6.5 Condensation of Sputtered Species
6.6 Sputter Deposition Geometries
6.7 Targets and Target Materials
6.8 Process Monitoring and Control
6.9 Contamination Due to Sputtering
6.10 Advantages and Disadvantages of Sputter Deposition
6.11 Some Applications of Sputter Deposition
6.12 Summary
Further Reading
References

7. Arc Vapor Deposition
7.1 Introduction
7.2 Arcs
7.3 Arc Source Configurations
7.4 Reactive Arc Deposition
7.5 Arc Materials
7.6 Arc Vapor Deposition System
7.7 Process Monitoring and Control
7.8 Contamination Due to Arc Vaporization
7.9 Advantages and Disadvantages of Arc Vapor Deposition
7.10 Some Applications of Arc Vapor Deposition
7.11 Summary
Further Reading
References

8. Ion Plating and Ion Beam Assisted Deposition
8.1 Introduction
8.2 Stages of Ion Plating
8.3 Sources of Depositing and Reacting Species
8.4 Sources of Energetic Bombarding Species
8.5 Sources of Accelerating Potential
8.6 Some Plasma-Based Ion Plating Configurations
8.7 Ion Beam Assisted Deposition (IBAD)
8.8 Process Monitoring and Control
8.9 Contamination in the Ion Plating Process
8.10 Advantages and Disadvantages of Ion Plating
8.11 Some Applications of Ion Plating
8.12 A Note on Ionized Cluster Beam (ICB) Deposition
8.13 Summary
Further Reading
References

9. Atomistic Film Growth and Some Growth-Related Film Properties
9.1 Introduction
9.2 Condensation and Nucleation
9.3 Interface Formation
9.4 Film Growth
9.5 Reactive and Quasi-Reactive Deposition of Films of Compound Materials
9.6 Post Deposition Processing and Changes
9.7 Deposition of Unique Materials and Structures
9.8 Summary
Further Reading
References

10. Film Characterization and Some Basic Film Properties
10.1 Introduction
10.2 Objectives of Characterization
10.3 Types of Characterization
10.4 Stages and Degree of Characterization
10.5 Some Film Properties
10.6 Summary
Further Reading
References

11. Adhesion and Deadhesion
11.1 Introduction
11.2 Origin of Adhesion and Adhesion Failure (Deadhesion)
11.3 Adhesion of Atomistically Depositied Inorganic Films
11.4 Adhesion Failure (Deadhesion)
11.5 Adhesion Testing
11.6 Designing for Good Adhesion
11.7 Failure Analysis
11.8 Summary
Further Reading
References

12. Cleaning
12.1 Introduction
12.2 Gross Cleaning
12.3 Specific Cleaning
12.4 Application of Fluids
12.5 Removal of Particulate Contamination
12.6 Rinsing
12.7 Drying, Outgassing, and Outdiffusion
12.8 Cleaning Lines
12.9 Handling and Storage/Transportation
12.10 Evaluation and Monitoring of Cleaning
12.11 In Situ Cleaning
12.12 Contamination of the Film Surface
12.13 Safety
12.14 Summary
Further Reading
References

13. External Processing Environment
13.1 Introduction
13.2 Reduction of Contamination
13.3 Materials
13.4 Body Coverings
13.5 Processing Areas
13.6 Summary
Further Reading
References

Appendix 1: Reference Material
A1.1 Technical Journals and Abbreviations
A1.2 Periodicals and Abbreviations
A1.3 Other
A1.4 Buyers Guides, and Product and Services Directories
A1.5 Societies, Associations, and Other Organizations
A1.6 Publishers
A1.7 Web Site Index
Appendix 2: Transfer of Technology from R&D to Manufacturing
A2.1 Stages of Technology Transfer
A2.2 Organization
A2.3 R&D and Manufacturing "Environments"
A2.4 Communication
A2.5 Styles of Thinking
A2.6 Training
References
Glossary of Terms and Acronyms used in Surface Engineering
Index

[ Last edited by crisoo on 2006-12-8 at 08:46 ]

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