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sltmac(½ð±Ò+1): лл½»Á÷~ 2011-07-06 21:30:03
Ë®ÖÐÂÌÖÞ(½ð±Ò+20, ·ÒëEPI+1): ·Ç³£¸Ðл 2011-07-07 07:49:05
sltmac(½ð±Ò+1): лл½»Á÷~ 2011-07-06 21:30:03
Ë®ÖÐÂÌÖÞ(½ð±Ò+20, ·ÒëEPI+1): ·Ç³£¸Ðл 2011-07-07 07:49:05
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±¡Ä¤ÔÚ´¹Ö±ÓÚ±¡Ä¤±íÃæ·½ÏòÉϵĿÅÁ£³ß´ç²Î²î²»Æë£¬µ¼ÖÂÁ˲»Í¬µÄ±¡Ä¤´Ö²Ú¶È£¬´Ó¶øÓ°Ïìµç×ÓÔÚ±¡Ä¤ÖеÄÊäÔË£¬µ¼Ö±¡Ä¤µç×èÂʵı仯¡£±¡Ä¤µç×èÂÊËæ×űíÃæ´Ö²Ú¶ÈµÄÔö¼Ó¶øÔö´ó¡£ The particle sizes along the direction perpendicular to the thin film surface are various, leading to different film roughness. As a result, the electron transportation in the thin films are influenced, and the resistivities of the films are different. It is found that the thin film resistivity increases with the surface roughness. |
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