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ÁòËáͺÍÈéËᣬ ÓÃÇâÑõ»¯ÄƵ÷PhÖµµ½9 ÕâÔõôʵÏֵģ¬ÍÀë×ÓË®ÈÜÒº£¬ÉÔÆ«¼îÐÔһЩ¾Í»á·¢Éú³ÁµíÁ˰¡ Adv. Mater. 2009, 21, 3012¨C3015 Fabrication of Three-Dimensional Photonic Crystals Using Multibeam Interference Lithography and Electrodeposition Electrodeposition: Electrodeposition of Cu2O[31] was performed using a conventional three-electrode setup. A platinum plate and a Ag/AgCl in saturated potassium chloride aqueous solution (SSE) were used as counter and reference electrodes, respectively. The electrolyte was an aqueous solution containing cupric sulfate (0.2 M) and lactic acid (1.6 M). The pH of the solution was adjusted to 9 by addition of sodium hydroxide. The solution temperature was kept constant at 65 8C during deposition. The Cu2O layer was grown under potentiostatic conditions at _0.55 V versus SSE. To facilitate infilling of the hydrophobic SU-8 template with the cupric sulfate aqueous solution, the 3D template was first wetted by ethanol before electrodeposition. |
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