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Frontier in Materias（IF 3.2）征氧化物半导体材料，器件，电路相关的稿件
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Frontier in Materias （影响因子：3.2）征氧化物半导体材料，器件，电路相关的稿件，计算和实验都欢迎！具体信息请见下文和链接： https://www.frontiersin.org/research-topics/61339/emerging-oxide-semiconductors-for-back-end-of-line-integration-and-advanced-display/overview ***Call for Papers in the journal Frontiers in Materials: Deadline May 31, 2024 ***Research Topic: Emerging Oxide Semiconductors for Back-end-of-line Integration and Advanced Display We are excited to announce that submissions are now open for the above-mentioned research topic in the esteemed Frontiers in Materials journal. Prospective authors are cordially invited to submit original research papers and reviews that align with but are not restricted to the following themes: (1) Advancements in Oxide Semiconductor Materials: Dive into novel materials, exploring their unique properties and focusing on growth, characterization, and their structural, electrical, and optical aspects. (2) Innovations in Fabrication Techniques and Device Architectures: Submit pioneering work on fabrication processes, techniques, and device structures that optimize the potential of oxide semiconductors. (3) Exploring Oxide Semiconductor Device Physics: Share comprehensive studies into the physics of these devices, including aspects like electronic transport, charge carrier dynamics, and reliability. (4) Applications in Cutting-Edge Circuits and Beyond: Present your research on the use of oxide semiconductors in advanced circuit applications, display technologies (AR/VR), and innovative computing solutions. For more details and submission guidelines, please visit: https://www.frontiersin.org/research-topics/61339/emerging-oxide-semiconductors-for-back-end-of-line-integration-and-advanced-display/overview Don't miss this opportunity to contribute to a groundbreaking field. We look forward to your submissions! |
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