| 查看: 547 | 回复: 2 | |||
| 当前主题已经存档。 | |||
lookingfyou木虫 (正式写手)
|
[交流]
Si的经典文章
|
||
|
Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and Phosphorus 经典老文章 可以说是当今集成电路基础的基础 作者:G. L. Pearson and J. Bardeen(巴丁) 注释:Phys. Rev. 75, 865–883 (1949) 摘要/内容: Electrical resistivity and Hall measurements have been made over the temperature range from 87° to 900°K on pure silicon and on silicon alloys containing from 0.0005 to 1.0 percent boron (p-type impurity) or phosphorus (n-type impurity). X-ray measurements indicate that both elements replace silicon in the lattice. It is shown that each added boron atom contributes one acceptor level, and it is likely that each added phosphorous contributes a donor level. The temperature variation of the concentrations of carriers, electrons and holes, and of their mobilities, are determined from the resistivity and Hall data for the different samples. In the intrinsic range, at high temperatures, conductivity results from electrons thermally excited from the filled band to the conduction band. The energy gap is about 1.12 ev. The product of electron and hole concentration at any temperature is nenh=7.8 x 1032T3exp(-12,900 / T) In the saturation range, which occurs just below the intrinsic range, the concentrations are independent of temperature. All donors (or acceptors) are ionized and the concentration of carriers is equal to the net concentration of significant impurities (P or B). The energy, EA, required to ionize an acceptor by exciting an electron from the filled band, as determined from the temperature variation of concentration at lower temperatures, decreases with increasing impurity concentration and vanishes for concentrations above 5 x 1018/cm3. The value of EA at high dilution, 0.08 ev, is about what is expected for a hole moving in a hydrogen-like orbit about a substitutional B- ion. The decrease in EA with increase in concentration is attributed to a residual potential energy of attraction between the holes and impurity ions. The ionization energy of donors is less than that of acceptors, probably because conduction electrons have a smaller effective mass than holes. In samples with large impurity concentrations the carriers form a degenerate gas at low temperatures, and the resistivity and Hall coefficient become independent of temperature. At high temperatures the mobilities of electrons and holes approach the values µe=3.0µh=15 x 105T-3 / 2(cm2 / volt sec .). These values are determined by lattice scattering and are independent of impurity concentration. At lower temperatures scattering by both ionized and neutral impurity centers contribute, and the mobility is largest for the more pure samples. Impurity scattering increases rapidly with decrease in temperature and the mobility passes through a maximum which depends on impurity concentration. Theories of impurity scattering of Conwell and Weisskopf, of Johnson and Lark-Horovitz, and of Mott give mobilities which agree as to order of magnitude with the observed. [ Last edited by lookingfyou on 2005-12-20 at 18:42 ] |
» 猜你喜欢
氨基封端PDMS和HDI反应快速固化
已经有11人回复
博士申请都是内定的吗?
已经有11人回复
博士读完未来一定会好吗
已经有38人回复
谈谈两天一夜的“延安行”
已经有3人回复
之前让一硕士生水了7个发明专利,现在这7个获批发明专利的维护费可从哪儿支出哈?
已经有11人回复
论文投稿求助
已经有4人回复
Applied Surface Science 这个期刊。有哪位虫友投过的能把word模板发给我参考一下嘛
已经有3人回复
投稿精细化工
已经有6人回复
2楼2005-12-20 19:56:57
1
![]() |
3楼2005-12-22 08:28:53













回复此楼