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19840321xm银虫 (小有名气)
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【求助】石英晶体微天平基片的处理
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| 石英晶体微天平上带有金电极的基片除了用‘piranha’溶液处理外,还可以用什么方法来处理?最好有处理后效果也很好的方法!多谢各位! |
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Methods and Protocols This is a collection of standard protocols for surface and instrument preparation and cleaning. Cleaning - UVO Treatment Method Cleaning Applicable to: Crystals and tweezers. Note: not applicable to Ag surfaces! Function Removes low molecular weight hydrocarbons through oxidation. General The UV/Ozone treatment is performed in an UV/Ozone chamber in which a special lamp is fitted that generates light at the specific wavelength 185nm and 254nm. The surface is treated both with the UV wavelength from the lamp and the generation of Ozone by breakage of the O-O bond by the 185 nm wavelength. The treatment works in two ways, organic contaminants on the crystal surface are volatilized and readily removed and the underlying surface is slightly oxidized. Note that the treatment does not work for removal of thick organic films. Protocol Place the crystals in an UV/Ozone chamber approximately 5mm from the UVO lamp; switch the lamp on for 5-10 minutes on each side. The time is dependant on the power of the lamp a minimum of 12mW/cm2@1” of the 254nm lamp is recommended. References J.R. Vig, J. Vac Sci. Technol. A 3 (1985) 1027 Krozer et al, J. Vac. Sci. Technol. A 15 (1997) 1704 Cleaning - Chemical treatment - APM (Ammonia Peroxide Mix, TL1) Method Cleaning Applicable to: Gold and most other metal surfaces. Note: Not applicable to SiO2! Function Removes organic and biologic material through oxidation General The chemical treatment removes most organic and biological substances and is a very good way to clean surfaces when reusing them. This procedure should be performed under a fume hood and with the proper protection (eye wear and gloves). Protocol UVO treatment of the crystals for 5-10 minutes (see UVO treatment). Heat a 5:1:1 mixture of mQ-water, ammonia (25%) and hydrogen peroxide (30%) to 75°C, 5-10 ml are sufficient. Place the crystals in the heated solution for 5 minutes. Rinse with mQ water. Dry with Nitrogen gas. UVO treatment of the crystals for 5-10 minutes (see UVO treatment). References W. Kern et al, RCA Review 31 (1970) 187 Cleaning – Surfactant treatment Method Cleaning Applicable to: Any crystal (standard for SiO2) Function Removes organic and biologic material with surfactants General The chemical treatment removes most biological substances such as proteins and lipids and is a very good way to clean surfaces when reusing them. Protocol UVO treatment of the crystals for 5-10 minutes (see UVO treatment). Prepare a solution of 2% Sodium Dodecyl Sulfate (SDS*) in mQ water. Immerse the crystals in the solution for 30 min in room temperature. Rinse with mQ water. Dry with Nitrogen gas. UVO treatment of the crystals for 5-10 minutes (see UVO treatment). References K. Harewood et al., Anal. Biochem. 55 (1973) 573 J. Penfold et. al., Langmuir 18 (2002) *) Alternative surfactants may be used Cleaning – Removing polymeric coatings treatment Method Cleaning Applicable to: Removal of polymers (PS) Function Removes polymeric coatings by dissolving the material General Polymer coated surfaces like polystyrene (PS) can be recycled by removing the applied polymer followed by subsequent spin coating of new polymer or another polymeric material. Protocol Immerse the crystals in a 1:1 solution of toluene* and mQwater. Sonicate (1 min). The polymer will be dissolved in the organic phase. Wait until the phases separate and pour out the top (organic+polymer) phase from the beaker. Rinse with mQ and dry with N2 If necessary repeat with longer duration and/or mild heating. *) Alternative solvents might be required depending on polymer type Cleaning – Removing biofilms and bacteria Method Cleaning Applicable to: Metal & Metal Oxides Function Removes bacteria, biofilm General When performing measurements on bacteria or on biofilms the bacteria sometimes modify the metal surface (depletion of certain ions in alloys) for instance, this might make the recycling less useful. Protocol Immerse the crystals in 99% Ethanol solution. Sonicate for 5 minutes Immerse the crystals in 2% SDS solution. Sonicate for 5 minutes Rinse with mQ water, dry with N2. |
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