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[交流]
IWAPS 2020 专题介绍——计算光刻(二)
第四届国际先进光刻技术研讨会(International Workshop on Advanced Patterning Solutions)将于11月5~6日在四川成都举办。
第四届国际先进光刻技术研讨会由中国集成电路创新联盟与中国光学学会联合主办,由中国科学院微电子研究所、中国科学院光电技术研究所、中科微电子产业技术西南研究院以及四川省经济合作局承办。IWAPS研讨会专注于高端光刻技术,为来自国内外半导体工业界、学术界的资深技术专家和优秀研究人员等提供了一个技术交流平台,参会者可以就材料、设备、工艺、测量、计算光刻和设计优化等主题分享各自的研究成果,探讨图形化解决方案,研讨即将面临的技术挑战。
Computational lithography
Computational lithography is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Photolithography is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational lithography aims at computer optimization of patterns, using optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools. Computational lithography draws from the rich theory of optical optimization, computational imaging, image processing, etc. It is worth mentioning that current works on IWAPS2020 explore applications of machine learning on solving problems encountered by advanced lithography.
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