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ɰÂÖ±íÃæÑõ»¯Ä¤¶Ô±£Ö¤ÔÚÏßµç½âÐÞÕû£¨ELID-electrolytic in process dressing£©Ä¥Ï÷µÄ·ÇÏßÐÔµç½âÒÔ¼°¶Ô¸ÄÉÆÄ¥Ï÷±íÃæÖÊÁ¿¶¼¾ßÓм°ÆäÖØÒªµÄ×÷Óá£Ñõ»¯Ä¤µÄÓ²¶ÈԼΪ210Mpa£¬ÊÇ»ùÌåÓ²¶ÈµÄ1/4-1/3£¬Ê¹Ñõ»¯Ä¤ÓÐЧµØ¸ôÀëÁË»ùÌåÓ빤¼þ£¬±ÜÃâ»ùÌå»®ÉËÄ¥Ï÷±íÃæ¡£µ¯ÐÔ±äÐθüÒ×·¢Éú£¬ÓÐÀûÓÚÄ¥Á£µÄЭͬÐÔÓëµÈ¸ßÐÔ¡£ÓÉÓÚÑõ»¯Ä¤µÄ¶¯Ì¬¸üУ¬ÆäÖµÓëµç½â²ÎÊý¼°Ä¥Ï÷²ÎÊýÓйء£

[ Last edited by xsh1 on 2009-7-18 at 16:58 ]

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monitor2885

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xsh1(½ð±Ò+1,VIP+0):лл²ÎÓ룡 7-19 12:59
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2Â¥2009-07-18 20:33:06
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lhhe

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xsh1(½ð±Ò+1,VIP+0):лл²ÎÓ룡 7-19 13:00
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3Â¥2009-07-19 09:53:47
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xsh1

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The oxide films have most significant roles in nonlinear electrolysis and to improve the surface quality in ELID grinding process.

The oxide film with hardness of about 210Mpa, is 1/4-1/3 of the matrix, the workpiece and matrix was effectively isolated and the scratching ground surface was avoided.

The elastic deformation is more likely and contributes immensely to the synergy and same height of grain.

Due to the dynamic update of the oxide film, its stiffness has a connection with electrolysis parameters and grinding parameters.
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4Â¥2009-07-19 12:56:07
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lhhe

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xsh1(½ð±Ò+2,VIP+0):¸Ðл°ïÖú·­Ò룡½ð±Ò²»¶à£¬Áıíл³À¡£ 7-20 10:42
the surface oxide film plays important roles in improving the nonlinear electrolysis procedure during ELID grinding and the quality of the grounded surface.

The oxide film has a hardness of  ~210Mpa, which is only 1/4-1/3 of the hardness of the matrix. The soft oxide film helps to protect the grounded surface from being scratched by the hard matrix.

The elastic deformation due to the softness of the oxide film makes ЭͬÐÔÓëµÈ¸ßÐÔ Ì«×¨Òµ£¬Â¥Ö÷×Ô¼ºÕå×Ã

dynamic procedure of the oxide film makes the whole grounding procedure as a function of electrolysis parameters and grinding parameters.
5Â¥2009-07-20 05:36:05
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lixiaod001

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xsh1(½ð±Ò+2,VIP+0):¸Ðл°ïÖú£¡ 7-20 10:43
Wheel to ensure that the surface oxide film on ELID (ELID-electrolytic in process dressing) grinding, as well as the non-linear electrolysis to improve the quality of grinding surface and have an important role. About the hardness of the oxide film 210Mpa, is 1/4-1/3 of the matrix hardness, the oxide film so that the effective isolation of the substrate and the workpiece to avoid the grinding scratch the surface of the matrix. More susceptible to elastic deformation and is conducive to abrasive and highly collaborative nature. Oxide film due to the dynamic update, the value and electrolysis parameters and grinding parameters.
6Â¥2009-07-20 09:45:35
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