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erran木虫 (著名写手)
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【资源】化学气相沉积手册，第二版，快下。
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Reviews in depth the recent expansion of the number of materials produced by CVD; copper, tungsten, diamond, silicon carbide, silicon nitride, titanium nitride and others. DLC: Chemical vapor deposition. Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. This second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallic-organic CVD (MOCVD) are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.8 The new edition also chronicles the recent expansion of a number of materials produced by CVD, including copper, tungsten, diamond, silicon carbide and silicon nitride, titanium nitride, and others. Key Features: Practical approach in the handbook stresses CVD use in industry, such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters, and man others Coverage of the chemistry and deposition techniques of new materials produced by CVD as been greatly expanded in the book - Special focus on the rapid growth of two major CVD processes: plasma CVD and metallo-organic CVD - Emphasizes the broad expansion of the use of CVD processes in today’s industry, showing the reasons for the growth and the different appli-cations that have developed in the last few years 地址：http://rapidshare.com/files/4122 ... apor_Deposition.rar http://mihd.net/3.174/0815514328.rar.html 记得给星星！！！ [ Last edited by erran on 2009-6-25 at 09:30 ] |
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