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It is widely accepted in the open literature that rutile exhibits lower photocatalytic activity than anatase . This effect is generally attributed to differences in the electronic structure and not to differences in surface area values. The different behavior of rutile and anatase was initially attributed to the different position of the conduction- band (more positive for rutile) and to the higher recombination velocity of electron-hole pairs photoproduced in rutile . Other authors  postulated that the photocatalytic activity of different surfaces is influenced both by defect concentration and by the atomic makeup of the states close to the Fermi level. Under identical surface preparations, the 101 anatase surface has stronger defect-state intensity relative to the valence band maximum (VBM) than the equivalent 110 rutile surface. In terms of the atomic character of the states close to the Fermi level, the anatase 101 surface is different from rutile 110 surfaces, in that it shows markedly less Ti 3d or 4sp character in the states around the VBM. This in turn means that the states at the conduction-band minimum should be of quite pure Ti 3d character with little mixing with O 2p. This conclusion leads to efficient localization of the conduction- band electron created by photoabsorption in a state of Ti3+ character preventing hole-electron recombination

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