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[已搜无重复] Fundamentals of Electrochemical Deposition 2nd-ed （增纳米盘）
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Fundamentals of Electrochemical Deposition (The ECS Series of Texts and Monographs) By Milan, PhD Paunovic, Mordechay, PhD Schlesinger -------------------------------------------------------------------------------- Publisher: Wiley-Interscience Number Of Pages: 373 Publication Date: 2006-08-04 ISBN-10 / ASIN: 0471712213 ISBN-13 / EAN: 9780471712213 Binding: Hardcover -------------------------------------------------------------------------------- Product Description: Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields." -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including: * Metal-solution interphase * Charge transfer across an interphase * Formation of an equilibrium electrode potential * Nucleation and growth of thin films * Kinetics and mechanisms of electrodeposition * Electroless deposition * In situ characterization of deposition processes * Structure and properties of deposits * Multilayered and composite thin films * Interdiffusion in thin film * Applications in the semiconductor industry and the field of medicine This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material. Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology. -------------------------------------------------------------------------------- Summary: Electrochemical Deposition Rating: 4 This book being the first of its kind in the industry on electrochemical deposition is very informative and interesting. Copper damanscene being the future for CMP has somwhat made this book a neccessity to all personnel working in the micro electronics industry. The book gives a good grounding on electrochemical deposition and the underlying parameters that affect deposition. The only setback is that there is no effort being made to link the findings in the deposition of copper and how it affects the final CMP process. Being a new and first of its kind this is forgivable. Summary: Excellent Rating: 5 The book covers the major features of all kinds of electrochemical deposition and it is a handy book for all those involved in this kind of depostion studies.. 国内有进口纸本购买，价格在800左右。在网上苦苦搜索得到，不敢独享。 请不要吝啬你的五星级评价。  遍搜国内论坛，应该没有下载链接。唯此一家！  新增纳米盘：http://www.namipan.com/d/1a353e5 ... 22b581c44c8b2c43900 http://xinio.info/?http://ifile.it/vw4c1p7/0471712213.zip http://xinio.info/?http://ifile.it/vw4c1p7/0471712213.zip [ Last edited by yujingangcsu on 2009-5-23 at 09:14 ] |
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