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【求助】玻璃的硅烷化处理
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| 看了一篇文献,发现需要玻璃的硅烷化处理,有做过的同学吗,请教一下,需要什么样的试剂,及如何处理,谢谢! |
乃容斋
木虫 (正式写手)
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小木虫(金币+0.5):给个红包,谢谢回帖交流
jason168(金币+2,VIP+0):欢迎交流! 6-2 20:30
小木虫: 金币+2, 帖子真精彩 2014-09-18 10:59:47
小木虫(金币+0.5):给个红包,谢谢回帖交流
jason168(金币+2,VIP+0):欢迎交流! 6-2 20:30
小木虫: 金币+2, 帖子真精彩 2014-09-18 10:59:47
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我最近也在了解这方面的问题,我做的是纳米线不过。下面是我做的一个方法的总结,不知道对你有没有帮助。 1)氧等离子体处理(清洗和产生羟基)或清洗后The NWs devices were then placed in the ozone/UV chamber for 3 minutes. 2) piranha solution(浓硫酸和30%双氧水 v/v3:1)浸泡5 min, 分别在 H2O 和acetone 超声20 min, 再用 5 M NaOH 室温处理5min ,水清洗,1% APTMS 水或醇溶液处理 10-15 min硅烷化修饰。 3)hydroxylated using a NaOH solution (4M in ethanol 95%) during 2 h.This treatment creates OH groups and eliminates organic contamination. The samples are placed for 12 h in a solution 0.5M of APTES in 95% ethanol. After two successive rinses with ethanol and deionised water to remove unbound silane,the samples are dried and heated for 3 h at 110 ◦C. 4)the SnO2 films were immersed in 1% ethanol solution of APTES for 3 min at room temperature,rinsed with ethanol for three times, then heated at 125 ◦C for 15 min 5) First, the samples were sonicated in 0.2%(v/v) soapy water at 60 ℃, thoroughly washed with triple distilled water (TDW), and then dipped in hot (90 ℃) piranha solution for 60 min (3:7 by volume of 30% H2O2 :H2SO4 Afterward, substrates were rinsed with TDW and further cleaned with H2O/H2O2/NH3 (5:1:0.25) solution while sonicating for 15 min at 60 ℃. |
14楼2009-06-02 20:11:36
yccycc
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2楼2009-04-28 07:31:45
3楼2009-04-28 13:28:02
gywu0420
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4楼2009-04-28 15:36:58













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