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[资源]
2016年新著——化学气相沉淀：光学、太阳能电池和固态器件中的应用与进展（英文版）
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"Chemical Vapor Deposition: Recent Advances and Applications in Optical, Solar Cells and Solid State Devices" ed. by Sudheer Neralla ITexLi | 2016 | ISBN: 9535125737 9789535125730 9535125729 9789535125723 | 285 pages | PDF | 85 MB This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations. Contents Preface 1 Preparation and Characterization of Carbon Nanofibers and its Composites by Chemical Vapor Deposition 2 Non-Classical Crystallization of Thin Films and Nanostructures in CVD Process 3 MOCVD Grown HgCdTe Heterostructures 4 Hot Filament Chemical Vapor Deposition: Enabling the Scalable Synthesis of Bilayer Graphene and Other Carbon Materials 5 In Situ Observation of Chemical Vapour Deposition Using Langasite Crystal Microbalance 6 Low‐Temperature PureB CVD Technology for CMOS Compatible Photodetectors 7 Silicon-Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition to Develop Silicon Light Sources 8 High‐Density Plasma‐Enhanced Chemical Vapor Deposition of Si‐Based Materials for Solar Cell Applications 9 Applications of CVD to Produce Thin Films for Solid‐State Devices 10 Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future  ITexLi | 2016 | ISBN: 9535125737 9789535125730 9535125729 9789535125723 | 285 pages | PDF | 85 MB |
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