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pof

铜虫 (小有名气)


[交流] 半导体的native oxide问题

半导体产业中,Si的一大优势就是它很容易得到native oxide作为insulating layer, 实现mos结构, 那么第二代半导体GaAs呢,有的资料中提到它没有native oxide,但在有的文章中却默认为会产生native oxide而进行研究和解释。 所以实际情况是什么样的呢? 常见的半导体中,哪些有native oxide,哪些没有native oxide呢? 掺杂以后对这一性质有影响吗?比如InGaAs,AlGaAs? ZnO或掺杂的ZnO会有类似的性质以产生insulating layer吗?
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pof

铜虫 (小有名气)


看来会有Ga的氧化和As的氧化行为存在,但在常温空气条件下,氧化行为会产生足以被认为是insulating layer的效果吗?
In order to know more about the surface state of GaAs(100) epitaxial wafer during a storage period of two years, the XPS analysis was carried out four times on the surface, respectively polished by chemical etching, stored in desiccator for half a year, one year and two years. The results indicated that even after cleaned by proper etchant solutions, the fresh surface was slightly oxidized with Ga2O3, As2O3 and organic contaminant. The epi-wafer was always exposed to air during the storage period, so more and more oxides turned out. The mixed oxide layer comprised of C-OR, COOR, Ga2O3, As2O3 and As2O5 appeared after only half a year. In the ageing process of two years, the oxide types of gallium or arsenic did not change with stable content of Ga2O3 and remarkably fluctuating relative contents of As2O3 and As2O5.

Proc. SPIE 8912, International Symposium on Photoelectronic Detection and Imaging 2013: Low-Light-Level Technology and Applications, 89120N (August 16, 2013); doi:10.1117/12.2033679
2楼2014-01-08 17:32:53
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