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ÕâÆªÎÄÏ×ÔÝûÓб»sciÊÕ¼ µ«±»EIÊÕ¼ÁË£¨EIÏêÇéÈçÏ£© Accession number: 20132516432622 Title: Molten salt pulse electrodeposition of silicon on low silicon steel Authors: Yang, Hai-Li1; Shang, Lei1; Tang, Guo-Zhang1; Zhang, Yu-Zhu1; Li, Yun-Gang1 Author affiliation: 1 Hebei Key Laboratory of Modern Metallurgy Technology, College of Metallurgy and Energy, Hebei United University, Tangshan 063009, China Corresponding author: Li, Y.-G. (lyg@heuu.edu.cn) Source title: Materials Transactions Abbreviated source title: Mater. Trans. Volume: 54 Issue: 6 Issue date: 2013 Publication year: 2013 Pages: 1006-1011 Language: English ISSN: 13459678 CODEN: MTARCE Document type: Conference article (CA) Publisher: Japan Institute of Metals (JIM), 1-14-32 Ichibancho, Aoba-ku, Sendai, 980-8544, Japan Abstract: Low silicon steel was siliconized by pulse electrodeposition from KCl-NaCl-NaF-SiO2 molten salts and high silicon steel containing 6.5 mass% Si was prepared by followed diffusion annealing. The composition depth profile, the cross-section micrograph and the phase structure of the siliconized layer were characterized with glow discharge optical emission spectroscopy (GDOES), optical microscope (OM), scanning electron microscopy (SEM) with an X-ray energy dispersive spectrometer (EDS) and X-ray diffraction (XRD). The textures of substrate, deposited sample and high silicon steel were analyzed by the orientation distribution function (ODF). The results showed that Si was almost homogeneously distributed in the siliconized layer. The siliconized layer had a two-layer structure. The top layer composed of columnar grains and a layer with equiaxed grains close to the substrate. The phase structure of the layer was composed of Fe3Si with (110) preferred orientation. After diffusion annealing the undesirable £-fiber type texture {111}{110} and {111}{112} weakened, both easy magnetization direction Goss texture ({110}{001} and cube texture {100}{001} were intensified. © 2013 The Japan Institute of Metals and Materials. Number of references: 20 Main heading: Silicon steel Controlled terms: Electrodeposition - Emission spectroscopy - Fused salts - Glow discharges - Phase structure - Scanning electron microscopy - Silicon - Silicon oxides - Textures - X ray diffraction Uncontrolled terms: Composition depth profiles - Easy magnetization directions - Glow-discharge optical emission spectroscopy - High-silicon steel - Molten salt - Orientation distribution function - Pulse electrodeposition - X-ray energy dispersive spectrometers Classification code: 933 Solid State Physics - 813.1 Coating Techniques - 804.2 Inorganic Compounds - 804 Chemical Products Generally - 933.1.1 Crystal Lattice - 801 Chemistry - 712.1.1 Single Element Semiconducting Materials - 701.1 Electricity: Basic Concepts and Phenomena - 545.3 Steel - 741.1 Light/Optics DOI: 10.2320/matertrans.M2012257 Database: Compendex Compilation and indexing terms, © 2013 Elsevier Inc. |

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Record 1 from Compendex for: ((Molten Salt Pulse Electrodeposition of Silicon on Low Silicon Steel) WN All fields), 1969-2013 -------------------------------------------------------------------------------- Check record to add to Selected Records 1. Accession number: 20132516432622 Title: Molten salt pulse electrodeposition of silicon on low silicon steel Authors: Yang, Hai-Li1; Shang, Lei1; Tang, Guo-Zhang1; Zhang, Yu-Zhu1; Li, Yun-Gang1 Author affiliation: 1 Hebei Key Laboratory of Modern Metallurgy Technology, College of Metallurgy and Energy, Hebei United University, Tangshan 063009, China Corresponding author: Li, Y.-G. (lyg@heuu.edu.cn) Source title: Materials Transactions Abbreviated source title: Mater. Trans. Volume: 54 Issue: 6 Issue date: 2013 Publication year: 2013 Pages: 1006-1011 Language: English ISSN: 13459678 CODEN: MTARCE Document type: Conference article (CA) Publisher: Japan Institute of Metals (JIM), 1-14-32 Ichibancho, Aoba-ku, Sendai, 980-8544, Japan Abstract: Low silicon steel was siliconized by pulse electrodeposition from KCl-NaCl-NaF-SiO2 molten salts and high silicon steel containing 6.5 mass% Si was prepared by followed diffusion annealing. The composition depth profile, the cross-section micrograph and the phase structure of the siliconized layer were characterized with glow discharge optical emission spectroscopy (GDOES), optical microscope (OM), scanning electron microscopy (SEM) with an X-ray energy dispersive spectrometer (EDS) and X-ray diffraction (XRD). The textures of substrate, deposited sample and high silicon steel were analyzed by the orientation distribution function (ODF). The results showed that Si was almost homogeneously distributed in the siliconized layer. The siliconized layer had a two-layer structure. The top layer composed of columnar grains and a layer with equiaxed grains close to the substrate. The phase structure of the layer was composed of Fe3Si with (110) preferred orientation. After diffusion annealing the undesirable ¡ê-fiber type texture {111}{110} and {111}{112} weakened, both easy magnetization direction Goss texture ({110}{001} and cube texture {100}{001} were intensified. © 2013 The Japan Institute of Metals and Materials. Number of references: 20 Main heading: Silicon steel Controlled terms: Electrodeposition - Emission spectroscopy - Fused salts - Glow discharges - Phase structure - Scanning electron microscopy - Silicon - Silicon oxides - Textures - X ray diffraction Uncontrolled terms: Composition depth profiles - Easy magnetization directions - Glow-discharge optical emission spectroscopy - High-silicon steel - Molten salt - Orientation distribution function - Pulse electrodeposition - X-ray energy dispersive spectrometers Classification code: 933 Solid State Physics - 813.1 Coating Techniques - 804.2 Inorganic Compounds - 804 Chemical Products Generally - 933.1.1 Crystal Lattice - 801 Chemistry - 712.1.1 Single Element Semiconducting Materials - 701.1 Electricity: Basic Concepts and Phenomena - 545.3 Steel - 741.1 Light/Optics DOI: 10.2320/matertrans.M2012257 Database: Compendex Compilation and indexing terms, © 2013 Elsevier Inc. |
6Â¥2013-07-13 19:56:53
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