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ÌâÄ¿£ºMolten Salt Pulse Electrodeposition of Silicon on Low Silicon Steel
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sjmsxmhl: ½ð±Ò+2, ¡ïÓаïÖú 2013-07-13 19:32:48
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Accession number:       
20132516432622
        Title:        Molten salt pulse electrodeposition of silicon on low silicon steel
        Authors:         Yang, Hai-Li1; Shang, Lei1; Tang, Guo-Zhang1; Zhang, Yu-Zhu1; Li, Yun-Gang1
        Author affiliation:        1 Hebei Key Laboratory of Modern Metallurgy Technology, College of Metallurgy and Energy, Hebei United University, Tangshan 063009, China
        Corresponding author:         Li, Y.-G. (lyg@heuu.edu.cn)
        Source title:        Materials Transactions
        Abbreviated source title:        Mater. Trans.
        Volume:        54
        Issue:        6
        Issue date:        2013
        Publication year:        2013
        Pages:        1006-1011
        Language:        English
        ISSN:         13459678
        CODEN:         MTARCE
        Document type:        Conference article (CA)
        Publisher:        Japan Institute of Metals (JIM), 1-14-32 Ichibancho, Aoba-ku, Sendai, 980-8544, Japan
        Abstract:        Low silicon steel was siliconized by pulse electrodeposition from KCl-NaCl-NaF-SiO2 molten salts and high silicon steel containing 6.5 mass% Si was prepared by followed diffusion annealing. The composition depth profile, the cross-section micrograph and the phase structure of the siliconized layer were characterized with glow discharge optical emission spectroscopy (GDOES), optical microscope (OM), scanning electron microscopy (SEM) with an X-ray energy dispersive spectrometer (EDS) and X-ray diffraction (XRD). The textures of substrate, deposited sample and high silicon steel were analyzed by the orientation distribution function (ODF). The results showed that Si was almost homogeneously distributed in the siliconized layer. The siliconized layer had a two-layer structure. The top layer composed of columnar grains and a layer with equiaxed grains close to the substrate. The phase structure of the layer was composed of Fe3Si with (110) preferred orientation. After diffusion annealing the undesirable £-fiber type texture {111}{110} and {111}{112} weakened, both easy magnetization direction Goss texture ({110}{001} and cube texture {100}{001} were intensified. © 2013 The Japan Institute of Metals and Materials.
        Number of references:        20
        Main heading:         Silicon steel
        Controlled terms:         Electrodeposition  -  Emission spectroscopy  -  Fused salts  -  Glow discharges  -  Phase structure  -  Scanning electron microscopy  -  Silicon  -  Silicon oxides  -  Textures  -  X ray diffraction
        Uncontrolled terms:         Composition depth profiles  -  Easy magnetization directions  -  Glow-discharge optical emission spectroscopy  -  High-silicon steel  -  Molten salt  -  Orientation distribution function  -  Pulse electrodeposition  -  X-ray energy dispersive spectrometers
        Classification code:         933 Solid State Physics -  813.1 Coating Techniques -  804.2 Inorganic Compounds -  804 Chemical Products Generally -  933.1.1 Crystal Lattice -  801 Chemistry -  712.1.1 Single Element Semiconducting Materials -  701.1 Electricity: Basic Concepts and Phenomena -  545.3 Steel -  741.1 Light/Optics
        DOI:        10.2320/matertrans.M2012257
        Database:        Compendex
                Compilation and indexing terms, © 2013 Elsevier Inc.
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2Â¥2013-07-13 19:28:49
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sjmsxmhl

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2Â¥: Originally posted by wangkj at 2013-07-13 19:28:49
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Accession number:       
20132516432622
        Title:        Molten salt pulse electrodeposition of silicon on low silicon steel
        Authors:         Yang, Hai-Li1; Shang, ...

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3Â¥2013-07-13 19:31:12
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wangkj

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3Â¥: Originally posted by sjmsxmhl at 2013-07-13 19:31:12
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4Â¥2013-07-13 19:42:10
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wangkj

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Qing Feng

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5Â¥2013-07-13 19:46:46
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Record 1 from Compendex for: ((Molten Salt Pulse Electrodeposition of Silicon on Low Silicon Steel) WN All fields), 1969-2013


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1.  Accession number:  20132516432622

  Title:  Molten salt pulse electrodeposition of silicon on low silicon steel
  Authors:  Yang, Hai-Li1; Shang, Lei1; Tang, Guo-Zhang1; Zhang, Yu-Zhu1; Li, Yun-Gang1   
  Author affiliation:  1 Hebei Key Laboratory of Modern Metallurgy Technology, College of Metallurgy and Energy, Hebei United University, Tangshan 063009, China  
  Corresponding author:  Li, Y.-G. (lyg@heuu.edu.cn)  
  Source title:  Materials Transactions
  Abbreviated source title:  Mater. Trans.
  Volume:  54
  Issue:  6
  Issue date:  2013
  Publication year:  2013
  Pages:  1006-1011
  Language:  English
  ISSN:  13459678  
  CODEN:  MTARCE  
  Document type:  Conference article (CA)
  Publisher:  Japan Institute of Metals (JIM), 1-14-32 Ichibancho, Aoba-ku, Sendai, 980-8544, Japan
  Abstract:  Low silicon steel was siliconized by pulse electrodeposition from KCl-NaCl-NaF-SiO2 molten salts and high silicon steel containing 6.5 mass% Si was prepared by followed diffusion annealing. The composition depth profile, the cross-section micrograph and the phase structure of the siliconized layer were characterized with glow discharge optical emission spectroscopy (GDOES), optical microscope (OM), scanning electron microscopy (SEM) with an X-ray energy dispersive spectrometer (EDS) and X-ray diffraction (XRD). The textures of substrate, deposited sample and high silicon steel were analyzed by the orientation distribution function (ODF). The results showed that Si was almost homogeneously distributed in the siliconized layer. The siliconized layer had a two-layer structure. The top layer composed of columnar grains and a layer with equiaxed grains close to the substrate. The phase structure of the layer was composed of Fe3Si with (110) preferred orientation. After diffusion annealing the undesirable ¡ê-fiber type texture {111}{110} and {111}{112} weakened, both easy magnetization direction Goss texture ({110}{001} and cube texture {100}{001} were intensified. © 2013 The Japan Institute of Metals and Materials.
  Number of references:  20
  Main heading:  Silicon steel  
  Controlled terms:  Electrodeposition  -  Emission spectroscopy  -  Fused salts  -  Glow discharges  -  Phase structure  -  Scanning electron microscopy  -  Silicon  -  Silicon oxides  -  Textures  -  X ray diffraction  
  Uncontrolled terms:  Composition depth profiles  -  Easy magnetization directions  -  Glow-discharge optical emission spectroscopy  -  High-silicon steel  -  Molten salt  -  Orientation distribution function  -  Pulse electrodeposition  -  X-ray energy dispersive spectrometers  
  Classification code:  933 Solid State Physics -  813.1 Coating Techniques -  804.2 Inorganic Compounds -  804 Chemical Products Generally -  933.1.1 Crystal Lattice -  801 Chemistry -  712.1.1 Single Element Semiconducting Materials -  701.1 Electricity: Basic Concepts and Phenomena -  545.3 Steel -  741.1 Light/Optics
  DOI:  10.2320/matertrans.M2012257
  Database:  Compendex
   Compilation and indexing terms, © 2013 Elsevier Inc.
6Â¥2013-07-13 19:56:53
ÒÑÔÄ   »Ø¸´´ËÂ¥   ¹Ø×¢TA ¸øTA·¢ÏûÏ¢ ËÍTAºì»¨ TAµÄ»ØÌû

sjmsxmhl

ľ³æ (ÖøÃûдÊÖ)

ÒýÓûØÌû:
5Â¥: Originally posted by wangkj at 2013-07-13 19:46:46
¶ÔÁË °ïÄã²éÁË Ä¿Ç°Materials TransactionsÒѾ­²»ÊÇSCIÆÚ¿¯ÁË

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7Â¥2013-07-13 21:43:33
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