The most widely used approach for the preparation of bismuth film microelectrodes
involves in situ or ex situ electrochemical plating by reduction of Bi(+3) ions to metallic bismuth on a suitable supporting material.
大家对其中的 in situ or ex situ 怎么理解?具体操作时有什么区别?应该怎么来操作?
大家帮下忙啊!