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fjtony163

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爱与雨下(金币+1): 2011-10-28 19:36:48
295435736(金币+40, 翻译EPI+1): 还行，谢谢了 2011-10-28 21:16:20

Some literature points out that the distribution of PECVD deposition membrane has relationship with reacted gas distribution entering reaction room. So the lower plate adopted showerhead plate electrode and power feed used back center point feed on showerhead electrode. Lower plate is 110mm from vacuum chamber bottom and upper surface of upper plate is attached to ground when chip is put on lower surface. The distance between two plates could be adjustable in certain range.

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