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liuth(½ð±Ò+6,VIP+0):лл£¡ 10-19 14:13
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Skyandsun
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liuth(½ð±Ò+14,VIP+0):лл£¡ÐÁ¿àÁË£¡ 10-21 09:33
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£¨1£© ¹Ø¼ü´Ê£ºThe hydrogen-terminated Si(111) surface prepared was stable under air atmosphere for a day or more. Spectroscopic Studies on Electroless Deposition of Copper on Hydrogen-Terminated Si(111) Surface in NH4F Solution Containing Cu(II) Ions In-Churl Lee, Sang-Eun Bae, Moon-Bong Song, Jong-Soon Lee, Se-Hwan Paek, and Chi-Woo J. Lee* College of Science and Technology, Korea University, Jochiwon, Choongnam 339-700, Korea Received July 4, 2003 The electroless deposition of copper on the hydrogen-terminated Si(111) surface was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy, scanning tunneling microscopy (STM), and energy-dispersive spectroscopy (EDS). The hydrogen-terminated Si(111) surface prepared was stable under air atmosphere for a day or more. It was found from ATR-FTIR that two bands centered at 2000 and 2260 cm−1 appeared after the H-Si(111) surface was immersed in 40% NH4F solution containing 10 mM Cu2+. On the other hand, STM image included the copper islands with a height of 5 nm and a diameter of 10-20 nm. The EDS data displayed the presence of copper, silicon and oxygen species. The results were rationalized in terms of the redox reaction of surface Si atoms and Cu2+ ions in solutions, which are changed into Si(OH)x(F)y containing SiF6 2− ions and neutral copper islands. Key Words : Silicon, Copper, Ammonium fluoride, ATR, STM (2)Stability Study of Self-Assembled Monolayers on Silicon(111) Volume 2, Issue 1, Spring 2005 Nanoscape 89-95 Ï£Íû¶ÔÄãÓаïÖú£¡ [ Last edited by Skyandsun on 2009-10-22 at 17:21 ] |
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