Offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence
Presents comprehensive coverage of process sequences
Introduces readers to modern simulation tools
Addresses the practical aspects of integrated circuit fabrication
Clearly explains basic processing theory

Chapter 1. Introduction.

Chapter 2. Crystal Growth.

Chapter 3. Silicon Oxidation.

Chapter 4. Photolithography.

Chapter 5. Etching.

Chapter 6. Diffusion.

Chapter 7. Ion Implantation.

Chapter 8. Film Deposition.

Chapter 9. Process Integration.

Chapter 10. IC Manufacturing.

Chapter 11. Future Trends and Challenges.

Appendix A: List of Symbols.

Appendix B: International System of Units (SI Units).

Appendix C: Unit Prefixes.

Appendix D: Greek Alphabet.

Appendix E: Physical Constants.

Appendix F: Properties of Si and GaAs at 300 K.

Appendix G: Some Properties of the Error Function.

Appendix H: Basic Kinetic Theory of Gases.

Appendix I: SUPREM Commands.

Appendix J: Running PROLITH.

Appendix K. Percentage Points of the t Distribution.

Appendix L: Percentage Points of the F Distribution.

Index.
Printer Ready Icon Printer-ready version    Email A Friend Icon E-mail a friend   
Resources for Authors |  Librarians |  Instructors |  Booksellers |  Press |  Investors

Copyright © 2000-2008 by John Wiley & Sons (Asia) Pte. Ltd. or related companies. All rights reserved. Please read our Privacy Policy
Get RSS Feeds of New Wiley Titles   rss icon
Site Map